Ceramic Electrostatic Chuck

Introduction

SHINKO designs ceramic electrostatic chucks which are widely used for semiconductor wafer processing such as etching and CVD equipment.
SHINKO offers high quality, low cost, short lead time and manufactures using consistent production processes such as firing and machining of ceramic, assembly and inspection.
SHINKO's electrostatic chucks meets customers' state-of-the-art needs.

Features

• Material: Alumina ceramic (Coulomb force type and Johnsen-Rahbek effect type)
• Dimension: Max size φ300 mm
• Ceramic thickness: 0.8~10.0 mm
• Operation temperature: -20 ~ +200 °C
• Ceramic Surface: Available for grooving, embossing surface and optional surface roughness
• Others: Heater type is supported

Structure

Applications

• Semiconductor manufacturing equipment (Etching, Ashing, CVD, PVD)
• Wafer transfer tool